采用在线化学气相沉积法在玻璃基片上制备FTO(SnO2:F)薄膜,并通过调整原料MBTC(C4H9SnCl3)的含量实现FTO薄膜的雾度可控。采用雾度计、分光光度计、X射线衍射仪、扫描电子显微镜、原子力显微镜和四探针方阻计研究了不同雾度的FTO薄膜的微观结构和光电性能,并分析了雾度形成的机理。研究表明:随着MBTC投放量的增加,薄膜的晶粒粒径增大,膜层表面粗糙度增大,膜厚增加,雾度随之增加,同时晶粒趋向于(200)面生长;另一方面,随着雾度增加,透过率有所下降,薄膜的雾度与透过率是一对矛盾关系,高雾度和高透过率难以同时实现。
Haze controllable FTO (SnO2:F) films were prepared via on-line chemical vapor deposition on the floating glass substrates with various MBTC (C4H9SnCl3) contents. The structure and photoelectric properties of the films were investigated by haze-meter, spectrophotometer, X-ray diffractometer, scanning electron microscope, atomic force microscope and four-point probe sheet resis-tance meter, respectively. The haze formation mechanism was analyzed. The results show that the crystal size, the surface roughness of film, the film thickness and the haze increase with the increase of MBTC content. The crystals tend to the (200) plane growth when the MBTC content increases. The transmittance of film declines with the increase of the haze. It was found that it could be difficult to obtain the high haze and the high transmittance of the film simultaneously.